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Analysis of Optical Properties of SiO2 Thin Films for Various Thicknesses and Substrate Material Using Matlab Code

Received: 23 October 2019     Accepted: 19 November 2019     Published: 25 November 2019
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Abstract

Theoretical study using mathematical analysis supported by Matlab code was created, for Silicon dioxide (SiO2) thin films on various substrate materials (Aluminium, quartz, and silicon), and different thicknesses. Reflectance and transmittance of the (SiO2) thin film is strongly dependent on the electromagnetic wavelength. Many physical results were obtained. The results obtained serve as an illustration of the feasibility of simple techniques in measuring precisely the reflectance and absorptance of the (SiO2) thin film with an error not exceeding 0.1%. The reflectance and absorptance characteristics of multilayer thin film are strongly dependent on the wavelength of the electromagnetic waves. The effects of various substrate materials on the reflectance characteristics have been investigated by evaluating the reflectance curves of SiO2 thin films with thickness in the range of (100-1000) nm. The amplitude and periodicity of reflectance and absorptance changed with wavelength. Also the periodicity of this variety change with the film thickness and with the substrate material. In multilayer thin-film devices, the amount of light reflected at each interface can be adjusted by adjusting many factors like film thickness and substrate materials. beams phase can be adjusted by changing the layer thickness. There are thus two parameters associated with each layer, thickness and refractive index difference between film and substrate materials, which can be chosen to give the required performance.

Published in American Journal of Materials Synthesis and Processing (Volume 4, Issue 2)
DOI 10.11648/j.ajmsp.20190402.14
Page(s) 75-80
Creative Commons

This is an Open Access article, distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution and reproduction in any medium or format, provided the original work is properly cited.

Copyright

Copyright © The Author(s), 2019. Published by Science Publishing Group

Keywords

SiO2, Optical Properties, Thin Film, Matlab Code

References
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  • APA Style

    Zina Abd Alameer Al Shadidi, Ahmad Kadhum Falih. (2019). Analysis of Optical Properties of SiO2 Thin Films for Various Thicknesses and Substrate Material Using Matlab Code. American Journal of Materials Synthesis and Processing, 4(2), 75-80. https://doi.org/10.11648/j.ajmsp.20190402.14

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    ACS Style

    Zina Abd Alameer Al Shadidi; Ahmad Kadhum Falih. Analysis of Optical Properties of SiO2 Thin Films for Various Thicknesses and Substrate Material Using Matlab Code. Am. J. Mater. Synth. Process. 2019, 4(2), 75-80. doi: 10.11648/j.ajmsp.20190402.14

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    AMA Style

    Zina Abd Alameer Al Shadidi, Ahmad Kadhum Falih. Analysis of Optical Properties of SiO2 Thin Films for Various Thicknesses and Substrate Material Using Matlab Code. Am J Mater Synth Process. 2019;4(2):75-80. doi: 10.11648/j.ajmsp.20190402.14

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  • @article{10.11648/j.ajmsp.20190402.14,
      author = {Zina Abd Alameer Al Shadidi and Ahmad Kadhum Falih},
      title = {Analysis of Optical Properties of SiO2 Thin Films for Various Thicknesses and Substrate Material Using Matlab Code},
      journal = {American Journal of Materials Synthesis and Processing},
      volume = {4},
      number = {2},
      pages = {75-80},
      doi = {10.11648/j.ajmsp.20190402.14},
      url = {https://doi.org/10.11648/j.ajmsp.20190402.14},
      eprint = {https://article.sciencepublishinggroup.com/pdf/10.11648.j.ajmsp.20190402.14},
      abstract = {Theoretical study using mathematical analysis supported by Matlab code was created, for Silicon dioxide (SiO2) thin films on various substrate materials (Aluminium, quartz, and silicon), and different thicknesses. Reflectance and transmittance of the (SiO2) thin film is strongly dependent on the electromagnetic wavelength. Many physical results were obtained. The results obtained serve as an illustration of the feasibility of simple techniques in measuring precisely the reflectance and absorptance of the (SiO2) thin film with an error not exceeding 0.1%. The reflectance and absorptance characteristics of multilayer thin film are strongly dependent on the wavelength of the electromagnetic waves. The effects of various substrate materials on the reflectance characteristics have been investigated by evaluating the reflectance curves of SiO2 thin films with thickness in the range of (100-1000) nm. The amplitude and periodicity of reflectance and absorptance changed with wavelength. Also the periodicity of this variety change with the film thickness and with the substrate material. In multilayer thin-film devices, the amount of light reflected at each interface can be adjusted by adjusting many factors like film thickness and substrate materials. beams phase can be adjusted by changing the layer thickness. There are thus two parameters associated with each layer, thickness and refractive index difference between film and substrate materials, which can be chosen to give the required performance.},
     year = {2019}
    }
    

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  • TY  - JOUR
    T1  - Analysis of Optical Properties of SiO2 Thin Films for Various Thicknesses and Substrate Material Using Matlab Code
    AU  - Zina Abd Alameer Al Shadidi
    AU  - Ahmad Kadhum Falih
    Y1  - 2019/11/25
    PY  - 2019
    N1  - https://doi.org/10.11648/j.ajmsp.20190402.14
    DO  - 10.11648/j.ajmsp.20190402.14
    T2  - American Journal of Materials Synthesis and Processing
    JF  - American Journal of Materials Synthesis and Processing
    JO  - American Journal of Materials Synthesis and Processing
    SP  - 75
    EP  - 80
    PB  - Science Publishing Group
    SN  - 2575-1530
    UR  - https://doi.org/10.11648/j.ajmsp.20190402.14
    AB  - Theoretical study using mathematical analysis supported by Matlab code was created, for Silicon dioxide (SiO2) thin films on various substrate materials (Aluminium, quartz, and silicon), and different thicknesses. Reflectance and transmittance of the (SiO2) thin film is strongly dependent on the electromagnetic wavelength. Many physical results were obtained. The results obtained serve as an illustration of the feasibility of simple techniques in measuring precisely the reflectance and absorptance of the (SiO2) thin film with an error not exceeding 0.1%. The reflectance and absorptance characteristics of multilayer thin film are strongly dependent on the wavelength of the electromagnetic waves. The effects of various substrate materials on the reflectance characteristics have been investigated by evaluating the reflectance curves of SiO2 thin films with thickness in the range of (100-1000) nm. The amplitude and periodicity of reflectance and absorptance changed with wavelength. Also the periodicity of this variety change with the film thickness and with the substrate material. In multilayer thin-film devices, the amount of light reflected at each interface can be adjusted by adjusting many factors like film thickness and substrate materials. beams phase can be adjusted by changing the layer thickness. There are thus two parameters associated with each layer, thickness and refractive index difference between film and substrate materials, which can be chosen to give the required performance.
    VL  - 4
    IS  - 2
    ER  - 

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Author Information
  • Department of Physics Faculty of Education/Sabr, Aden University, Aden, Yemen

  • Department of Physics Faculty of Education, Aden University, Aden, Yemen

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